Realization of high transparent conductive vanadium-doped zinc oxide thin films onto flexible PEN substrates by RF-magnetron sputtering using nanopowders targets.

dc.contributor.authorSamir Hamrit
dc.date.accessioned2021-09-06T09:20:34Z
dc.date.available2021-09-06T09:20:34Z
dc.date.issued2021
dc.description.abstractRF-magnetron sputtering has been carried out at room temperature to deposit vanadium-doped zinc oxide (VZO) nanostructured thin films onto flexible PEN substrates. The sputtering targets of compacted VZO nanopowder have been prepared using a rapid and inexpensive Sol-Gel synthesis followed by a supercritical drying process. Structural and morphological study of VZO particles in the targets has been carried out via X-ray diffraction and Transmission Electron Microscopy (TEM). The nanostructured thin films have been characterized to analyze the structural, morphological, electrical and optical properties as a function of vanadium content from 0 to 4 at.%. Structural characterization of VZO thin films revealed that the deposited thin films have been grown preferentially along (002) and exhibit the hexagonal wurtzite structure. The cross-sectional and microstructural analysis performed by Scanning Electron Microscopy (SEM) confirms the columnar growth of nanostructures. The deposited thin films exhibit transparent behavior with transmission > 70% in the visible region. It has been observed that nanostructured thin films with vanadium content of 2% have demonstrated the lowest resistivity (5 × 10-4 Ω.cm) with Hall mobility of 16 cm2.V-1.s-1. The deposited vanadium doped nanostructured thin films would have potential applications in electronic and optoelectronic devicesen_US
dc.identifier.urihttp://dspace.univ-msila.dz:8080//xmlui/handle/123456789/25389
dc.publisherUniversité de M'silaen_US
dc.subjectNanopowders; RF-magnetron sputtering; Nanostructured thin films; V-doped ZnO; PEN substrates; TCO.en_US
dc.titleRealization of high transparent conductive vanadium-doped zinc oxide thin films onto flexible PEN substrates by RF-magnetron sputtering using nanopowders targets.en_US
dc.typeArticleen_US

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